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Computer simulation of diamond film growth by chemical vapor deposition using Monte Carlo method

dc.contributor.advisorScott, Hugh L.
dc.contributor.authorXing, Jian
dc.date.accessioned2019-01-11T21:08:13Z
dc.date.available2019-01-11T21:08:13Z
dc.date.issued1993-12
dc.identifier.urihttps://hdl.handle.net/11244/317039
dc.formatapplication/pdf
dc.languageen_US
dc.rightsCopyright is held by the author who has granted the Oklahoma State University Library the non-exclusive right to share this material in its institutional repository. Contact Digital Library Services at lib-dls@okstate.edu or 405-744-9161 for the permission policy on the use, reproduction or distribution of this material.
dc.titleComputer simulation of diamond film growth by chemical vapor deposition using Monte Carlo method
dc.contributor.committeeMemberRaff, Lionel M.
dc.contributor.committeeMemberPerk, J. H. H.
dc.contributor.committeeMemberAckerson, Bruce J.
dc.contributor.committeeMemberWesthaus, Paul
osu.filenameThesis-1993D-X6c.pdf
osu.accesstypeOpen Access
dc.type.genreDissertation
dc.type.materialText
thesis.degree.disciplinePhysics
thesis.degree.grantorOklahoma State University


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