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Method of Depositing Doped Amorphous Semiconductor on a Substrate
(U.S. Patent and Trademark Office, 1982-09-07)
A method of depositing a doped amorphous semiconductor on a base material including the steps of subjecting the base to an environment including a semiconductor gas such as silane or germane, a dopant gas such as arsine, ...
Micronutrient Fertilizer
(U.S. Patent and Trademark Office, 1982-05-04)
Micronutrient fertilizer consisting of iron, manganese, copper, boron, and zinc in which the manganese-to-iron ratio is 8 to 20%, the copper-to-iron ratio is 5 to 10%, the boron-to-iron ratio is 0.4 to 1.0%, and the ...