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    • Method of Depositing Doped Amorphous Semiconductor on a Substrate 

      Rockley, Mark G.; Mains, Gilbert J.; Board of Regents/Oklahoma State University and the A & M Colleges (U.S. Patent and Trademark Office, 1982-09-07)
      A method of depositing a doped amorphous semiconductor on a base material including the steps of subjecting the base to an environment including a semiconductor gas such as silane or germane, a dopant gas such as arsine, ...